Application To Bilayer System With Water-Soluble Contrast Enhancing Material

Mitsuo Yabuta; Naoki Ito; Hiroyuki Yamazaki; Toshimasa Nakayama

doi:10.1117/12.975603

17 September 1987 Application To Bilayer System With Water-Soluble Contrast Enhancing Material

Mitsuo Yabuta, Naoki Ito, Hiroyuki Yamazaki, Toshimasa Nakayama

Proceedings Volume 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection; (1987) https://doi.org/10.1117/12.975603
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands

Abstract

We have developed ,a water-soluble contrast enhancing material, TAD-436 ( Tokyo Ohka. Anti-Defocus Material ) which is consisted of a water-soluble diazonium salt as bleaching compounds and a water-soluble anion type polymer as binder polymers. Needless to say that water is used as solvent in TAD; therefore, it can be spincoated directly on a positive photoresist layer of a quinonediazide-novolak resin type without causing intermixing and furtheremore the bilayer can be developed without stripping TAD immediately after exposure. TAD shows a satisfactory bleaching characteristics on g-line, increases r-value of underlying photoresist and reduces the thickness loss of photoresist layer in unexposed area. Application to bilayer system with TAD will raise the resolution of underlying photoresist and when the focus depth is changed it will make the change in the resist profile small. As the result of it, the notches in the resist patterns on steps is reduced, making the difference in the linewidth between the top and the bottom of steps small.

Citation Download Citation

Mitsuo Yabuta, Naoki Ito, Hiroyuki Yamazaki, and Toshimasa Nakayama "Application To Bilayer System With Water-Soluble Contrast Enhancing Material", Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); https://doi.org/10.1117/12.975603

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