Interference Microscopy Of Surface Relief Structures

D. M. Gale; M. I. Pether; F. C. Reavell

doi:10.1117/12.975595

17 September 1987 Interference Microscopy Of Surface Relief Structures

D. M. Gale, M. I. Pether, F. C. Reavell

Proceedings Volume 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection; (1987) https://doi.org/10.1117/12.975595
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands

Abstract

A high resolution Linnik interference microscope has been constructed to record one dimensional phase and intensity images of line structures on integrated circuit wafers. The phase is measured by recording three interferograms with differing phases of the reference beam with respect to the object beam. Experimental results are presented for two test structures. Images obtained from the microscope are compared with those predicted by a theoretical model of image formation.

Citation Download Citation

D. M. Gale, M. I. Pether, and F. C. Reavell "Interference Microscopy Of Surface Relief Structures", Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); https://doi.org/10.1117/12.975595

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