17 September 1987 Quality Of Microlithographic Projection Lenses
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Proceedings Volume 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection; (1987) https://doi.org/10.1117/12.975593
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands
Abstract
The quality of a finished objective for microlithographic applications depends on factors like the design data, the material properties and the manufacturing precision which can be achieved. With the paper design of an h-line lens (N.A.=0.38, field diameter 20mm) as a guideline we present data on the quality as predicted by the design and on the imperfections to he expected in a finished product.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph Braat, Joseph Braat, } "Quality Of Microlithographic Projection Lenses", Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); doi: 10.1117/12.975593; https://doi.org/10.1117/12.975593
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