Digital Phase-Shifting Photoelasticity

F W. Hecker; H. Abeln

doi:10.1117/12.967170

1 January 1987 Digital Phase-Shifting Photoelasticity

F W. Hecker, H. Abeln

Proceedings Volume 0813, Optics and the Information Age; (1987) https://doi.org/10.1117/12.967170
Event: 14th Congress of the International Commission for Optics, 1987, Quebec, Canada

Abstract

Digital phase-shifting photoelasticity 1)2) can be regarded as an extension of recently introduced computer-aided phase-shifting methods, the objective of which is the detection of one phase (e.g. 3)4)), to a two-phase problem. The two phases governing, in a general case, intensity distributions of photo-elastic patterns of planely stressed bodies are: relative retardation S(xl,x2), which is related to the difference of local principal stresses, and isoclinic parameter a(x1,x2), which describes the angular position of local principal axes belonging to principal stresses ai ?ooli. It is known from photoelastic point methods (compensation and ac-phase measurement techniques5)) that phase-shifting of photoelastic patterns is achieved by independent rotation of two polarizing components of a polariscope.

Citation Download Citation

F W. Hecker and H. Abeln "Digital Phase-Shifting Photoelasticity", Proc. SPIE 0813, Optics and the Information Age, (1 January 1987); https://doi.org/10.1117/12.967170

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available