2 February 1988 Computer Simulation Of Substrate Defect Propagation In Thin Films
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Abstract
A thin-film growth simulation of the type first introduced by Henderson et. al.1 is applied to defect propagation in thin films. Film growth is simulated on substrates having sinusoidally varying surfaces. The surfaces of the simulated films are then characterized by their power spectrum and their correlation with the substrate surface. The effects of film thickness as well as substrate sinusoid variation period and amplitude are investigated.
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R. B. Sargent, Dar-Yuan Song, H. A. Macleod, "Computer Simulation Of Substrate Defect Propagation In Thin Films", Proc. SPIE 0821, Modeling of Optical Thin Films, (2 February 1988); doi: 10.1117/12.941851; https://doi.org/10.1117/12.941851
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