Modeling Of Nodular Defects In Thin Films For Various Deposition Techniques.

Douglas J. Smith

doi:10.1117/12.941849

2 February 1988 Modeling Of Nodular Defects In Thin Films For Various Deposition Techniques.

Douglas J. Smith

Proceedings Volume 0821, Modeling of Optical Thin Films; (1988) https://doi.org/10.1117/12.941849
Event: 31st Annual Technical Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, San Diego, CA, United States

Abstract

The nodule has been successfully simulated for vapor deposition techniques by a modified hard-disk model. The influence of model parameters on nodule growth is more thoroughly explored in this paper. Also, by making minor changes in the model, simulations of amorphous film and sputtered film are considered. The model is compared with experimental results.

Citation Download Citation

Douglas J. Smith "Modeling Of Nodular Defects In Thin Films For Various Deposition Techniques.", Proc. SPIE 0821, Modeling of Optical Thin Films, (2 February 1988); https://doi.org/10.1117/12.941849

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