12 November 1987 Transparent And Heat-Reflecting ZnO:Al Films: Preparation And Optical Properties
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Abstract
ZnO:Al films were produced by dual-target reactive magnetron sputtering. The effects of different deposition conditions were investigated. Under optimized conditions, 0.3-pm-thick films had -1% luminous absorptance, ≈85 % thermal infrared reflectance, and a dc resistivity of ≈5 x 10-4 Ω cm. Rutherford Backscattering Spectrometry showed that the Al content was ≈2 at.%. Transmission electron microscopy showed that the crystallite size was ≈50 nm for films deposited onto unheated substrates.
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Z.-C. Jin, c. G. Granqvist, "Transparent And Heat-Reflecting ZnO:Al Films: Preparation And Optical Properties", Proc. SPIE 0823, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion VI, (12 November 1987); doi: 10.1117/12.941865; https://doi.org/10.1117/12.941865
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KEYWORDS
Aluminum

Reflectivity

Zinc oxide

Sputter deposition

Argon

Electrons

Energy efficiency

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