4 February 1988 X-Ray Lithography Using A KrF Laser-Produced Plasma
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Abstract
Experiments to demonstrate the feasibility of a small laser for x-ray lithography are discribed. Resist exposure experiment was performed by x-rays from a plasma produced by a KrF laser, 0.6 J/ 20 ns. With 50 shots exposure, a very fine pattern of 0.5 μm line & space was printed onto a resist EBR-9 at 3 cm from an iron plate target. The conditions for a laser-plasma to be a practical source for x-ray lithography are discussed.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
T. Tomie, T. Tomie, K. Koyama, K. Koyama, N. Atoda, N. Atoda, S . Komeiji, S . Komeiji, Y Matsumoto, Y Matsumoto, A. Yaoita, A. Yaoita, I. Matsushima, I. Matsushima, M. Yano, M. Yano, } "X-Ray Lithography Using A KrF Laser-Produced Plasma", Proc. SPIE 0831, X-Rays from Laser Plasmas, (4 February 1988); doi: 10.1117/12.965041; https://doi.org/10.1117/12.965041
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