Characterization Of GaAlAs Optical Waveguide Heterostructures Grown By Molecular Beam Epitaxy

C. J. Radens; H. E. Jackson; J. T. Boyd; K. B. Bhasin; J. J. Pouch; L. Davis

doi:10.1117/12.967529

1 January 1987 Characterization Of GaAlAs Optical Waveguide Heterostructures Grown By Molecular Beam Epitaxy

C. J. Radens, H. E. Jackson, J. T. Boyd, K. B. Bhasin, J. J. Pouch, L. Davis

Proceedings Volume 0836, Optoelectronic Materials, Devices, Packaging, and Interconnects; (1987) https://doi.org/10.1117/12.967529
Event: Cambridge Symposium on Fiber Optics and Integrated Optoelectronics, 1987, Cambridge, MA, United States

Abstract

Multiple layer GaA1As optical waveguide heterostructures have been grown by molecular beam epitaxy. These samples were designed to operate at a wavelength of .84 microns with negligible coupling of guided light to the absorbing GaAs substrate. The aluminum concentration was 13% for the guiding layer and was 16% for the cladding layers. The process for growing waveguide layers was calibrated primarily by high energy electron diffraction with the optical quality confirmed by photoluminescence measurements. Channel waveguide structures having widths of 5 microns were etched in a low pressure, magnetically confined, multipolar plasma reactor. The resulting waveguide structures were characterized by Raman spectroscopy, ellipsometry, Auger electron spectroscopy and optical waveguide loss measurements.

Citation Download Citation

C. J. Radens, H. E. Jackson, J. T. Boyd, K. B. Bhasin, J. J. Pouch, and L. Davis "Characterization Of GaAlAs Optical Waveguide Heterostructures Grown By Molecular Beam Epitaxy", Proc. SPIE 0836, Optoelectronic Materials, Devices, Packaging, and Interconnects, (1 January 1987); https://doi.org/10.1117/12.967529

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