14 April 1988 New Integrated Optics Structure On Silicon Substrate: Application to Optical Communication And Optical Interconnects
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Proceedings Volume 0862, Optical Interconnections; (1988) https://doi.org/10.1117/12.943463
Event: 1987 Symposium on the Technologies for Optoelectronics, 1987, Cannes, France
Abstract
We describe a new integrated optics structure achieved on silicon substrate by chemical vapor deposition of silica. That structure allows the realization of integrated optical circuit very attractive in the field of optical communications (multiplexer and demultiplexer, couplers...) but also in the new field of optical interconnects.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Valette, S. Valette, J. P. Jadot, J. P. Jadot, P. Gidon, P. Gidon, S. Renard, S. Renard, } "New Integrated Optics Structure On Silicon Substrate: Application to Optical Communication And Optical Interconnects", Proc. SPIE 0862, Optical Interconnections, (14 April 1988); doi: 10.1117/12.943463; https://doi.org/10.1117/12.943463
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