Paper
1 January 1987 Newest Results In Plasma-Impulse-CVD For Optical Fiber Fabrication
V Paquet, H Bauch, G Weidmann, R Th. Kersten
Author Affiliations +
Proceedings Volume 0866, Materials and Technologies for Optical Communications; (1987) https://doi.org/10.1117/12.943580
Event: 1987 Symposium on the Technologies for Optoelectronics, 1987, Cannes, France
Abstract
This paper gives a review on the state-of-the-art of the application of plasma-impulse-CVD (PICVD) for the preparation of preforms for optical fibers. Besides the fundamentals of the technological process we will deal with some experimental results with respect to the reaction kinetics and with problems involved in the preparation of pure Si02 core fibers, e.g. radiation resistance and losses.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
V Paquet, H Bauch, G Weidmann, and R Th. Kersten "Newest Results In Plasma-Impulse-CVD For Optical Fiber Fabrication", Proc. SPIE 0866, Materials and Technologies for Optical Communications, (1 January 1987); https://doi.org/10.1117/12.943580
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KEYWORDS
Optical fibers

Silica

Absorption

Plasmas

Signal attenuation

Cladding

Microwave radiation

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