Paper
9 May 1988 Dense-Pinch Photocathode
John F Asmus, Ralph H Lovberg
Author Affiliations +
Proceedings Volume 0873, Microwave and Particle Beam Sources and Propagation; (1988) https://doi.org/10.1117/12.965101
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States
Abstract
A promising approach to the generation of low-emittance e-beams for particle beam and FEL application employs a photoelectron cathode. IF such an e-beam source is to be viable at high power, a high-performance hard-UV illuminator is needed. Toward this end, experiments have been performed by illuminating a metal photocathode with the VUV radiation from a laser-guided gas-embedded high-density high-Z pinch. Such a VUV source is interesting because the plasma is created at high density and is optically thick. Thus, it is both a stable and an efficient radiator. Coupled with a copper photocathode it has generated a-beam current densities up to 60 A/sq-cm. The test device has been modified to utilize a pinch formed from a liquid jet in vacuum, rather than the laser-guided discharge in high-pressure gas. This is more suitable for rep-rate operation as it dispenses with the VUV-absorbing interposed gas, the channel-forming laser, and gas transport at high average power. A decane-jet device has been tested at 10 Hz with a peak pulse VUV power of 100 MW.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John F Asmus and Ralph H Lovberg "Dense-Pinch Photocathode", Proc. SPIE 0873, Microwave and Particle Beam Sources and Propagation, (9 May 1988); https://doi.org/10.1117/12.965101
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KEYWORDS
Liquids

Vacuum ultraviolet

Metals

Plasma

Ultraviolet radiation

Gas lasers

Particle beams

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