24 May 1988 Application Of Electron-Beam Lithography At Csem For Fabricating Computer-Generated Holograms
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Proceedings Volume 0884, Computer-Generated Holography II; (1988) https://doi.org/10.1117/12.944159
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States
Abstract
This paper presents the use of a standard electron-beam lithography for the fabrication of computer-generated holograms (CGH).
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H Buczek, H Buczek, J M Teijido, J M Teijido, } "Application Of Electron-Beam Lithography At Csem For Fabricating Computer-Generated Holograms", Proc. SPIE 0884, Computer-Generated Holography II, (24 May 1988); doi: 10.1117/12.944159; https://doi.org/10.1117/12.944159
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