Translator Disclaimer
24 May 1988 Fabrication Of Binary Optics Using Electron Beam Lithography
Author Affiliations +
Proceedings Volume 0884, Computer-Generated Holography II; (1988) https://doi.org/10.1117/12.944165
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States
Abstract
Electron beam lithography is applicable to the fabrication of binary optics. Practical aspects of generating binary masks for zone plates and diffraction gratings using the Manu-facturing Electron Beam Exposure System (MEBES III) at Perkin-Elmer are discussed.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James Logue "Fabrication Of Binary Optics Using Electron Beam Lithography", Proc. SPIE 0884, Computer-Generated Holography II, (24 May 1988); https://doi.org/10.1117/12.944165
PROCEEDINGS
5 PAGES


SHARE
Advertisement
Advertisement
Back to Top