29 June 1988 Ellipsometric Measurement Methods For Thin Film Technology
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Proceedings Volume 0891, Polarization Considerations for Optical Systems; (1988) https://doi.org/10.1117/12.944317
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States
Ellipsometric measurement methods allow the characterization of interfaces or thin films between two media. The non-pertubing character combined with a remarkable sensitivity makes these optical techniques suitable for in-situ measurements. Therefore the study to thicknesses and refractive indices of thin films during a vacuum coating process is one of many applications. The present paper will introduce an automatic photometric ellipsometer, which can operate together with high vacuum and ultra high vacuum plants. This rotating-analyzer ellipsometer (RAE) is one that uses a motor driven rotating analyzer to detect the state of polarization of light after its reflection from a surface under measurement. The use of a 32-bit-microcomputer together with a floating point processor makes it possible to compute one thickness and one refractive index value every 1.8 second also for multi-layer systems consisting of dielectrics and metals. After a detailed discussion of the hardware components and of the software tools, the precision of the instrument will be demonstrated by means of different applications.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Schwiecker, H. Schwiecker, K-H. Hammann, K-H. Hammann, U. Schneider, U. Schneider, } "Ellipsometric Measurement Methods For Thin Film Technology", Proc. SPIE 0891, Polarization Considerations for Optical Systems, (29 June 1988); doi: 10.1117/12.944317; https://doi.org/10.1117/12.944317

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