Paper
11 July 1988 Optical Constants For 22 Thin Film Materials In The 10 eV To 500 eV Photon Energy Region
D L Windt, VV Cash, M Scott, P Arendt, B Newnam, R F Fisher, A B Swartzlander, P Z Takacs, J M Pinneo, J B Kortright
Author Affiliations +
Proceedings Volume 0911, X-Ray and Vacuum Ultraviolet Interaction Data Bases, Calculations, and Measurements; (1988) https://doi.org/10.1117/12.945484
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States
Abstract
Reflectance measurements were used to derive the optical constants of 22 materials for 36 photon wavelengths from 24 Å to 1216 Å. The samples studied are thin films of the transition metals Ti, Zr, Nb, Mo, Ru, Rh, Pd, Hf, Ta, W, Re, Os, Ir, and Pt, the noble metals Ag and Au, and films of C, diamond, Al, Si, CVD-SiC and a-SiC. We describe the experiment and also the data reduction technique used to derive the optical constants from the reflectance versus incidence angle data. A summary of the results is presented.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D L Windt, VV Cash, M Scott, P Arendt, B Newnam, R F Fisher, A B Swartzlander, P Z Takacs, J M Pinneo, and J B Kortright "Optical Constants For 22 Thin Film Materials In The 10 eV To 500 eV Photon Energy Region", Proc. SPIE 0911, X-Ray and Vacuum Ultraviolet Interaction Data Bases, Calculations, and Measurements, (11 July 1988); https://doi.org/10.1117/12.945484
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KEYWORDS
Reflectivity

Surface roughness

Thin films

Extreme ultraviolet

Silicon

Silicon carbide

Crystals

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