22 June 1988 A Precision Pulsed UV Wavemeter
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Proceedings Volume 0912, Pulse Single-Frequency Lasers: Technology and Applications; (1988) https://doi.org/10.1117/12.945529
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States
Abstract
A UV wavemeter to determine absolute wavelength to one part in 107 at 308 nm has been fabricated and tested. The wavemeter consists of three fixed-plate, air-spaced Fabry-Perot etalons in an evacuated, thermally stabilized enclosure. The interference patterns created by the signal passing through the etalons are imaged onto silicon-diode arrays. This analog output is digitized and stored, and from the estimated wavelength and the known etalon spacing, a microcomputer calculates the interference order of the first etalon. The fractional order is calculated from the digitized image and used to give a better estimate of the absolute wavelength. This procedure is iterated and the order value refined for each subsequent etalon in the series, allowing increasingly accurate determination of the bandwidth and absolute wavelength. The XeCl spectrum can be resolved with an accuracy of ± 30 MHz, given by the inherent resolution of the calibration technique which involves a frequency-doubled ring dye laser and an iodine reference cell. The wavemeter is capable of similar performance at 351 nm (XeF) and 248 nm (KrF).
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Cheryl J White, Cheryl J White, Timothy L Boyd, Timothy L Boyd, Robert B Michie, Robert B Michie, John W Keto, John W Keto, } "A Precision Pulsed UV Wavemeter", Proc. SPIE 0912, Pulse Single-Frequency Lasers: Technology and Applications, (22 June 1988); doi: 10.1117/12.945529; https://doi.org/10.1117/12.945529
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