1 January 1988 MID UV Resist Materials Containing Pyridinium Ylides
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Abstract
Polymers containing pyridinium-ylide units were prepared as water soluble MID UV resist materials. The absorption maxima of the N-iminopyridinium ylides are centered around 320 nm. Upon exposure the ylide sensitizer bleaches cleanly and undergoes two competing reactions, leading via a singlet state to 1,2-diazepines and via a triplet state to pyridine and nitrenes. Both reactions are accompanied by a change in polarity and can be used in the application as photoresists. This pronounced polarity change renders the polymers hydrophobic and water repellant. Therefore negative images can be obtained by development with pure water. Due to a quantum yield below 0.1 the sensitivity is low, but can be enhanced by addition of sensitizers.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Reinhold Schwalm, Andreas Bottcher, Horst Koch, "MID UV Resist Materials Containing Pyridinium Ylides", Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 10.1117/12.968297; https://doi.org/10.1117/12.968297
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