1 January 1988 Mid-UV Photoresists Combining Chemical Amplification And Dissolution Inhibition
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Abstract
This paper describes the development of mid-UV photoresist materials based on the combined principles of chemical amplification and dissolution inhibition. These resists are composed of a novolac resin, a dissolution inhibitor containing an acid labile blocking group, and a photosensitive onium salt. A positive image is obtained by exposure to mid-UV irradiation, which generates a strong Bronsted acid from the onium salt, heating the resist so that the acid can catalyze deblocking of the acid labile groups on the dissolution inhibitor, and finally development with aqueous base. Interestingly, this system works well despite the fact that novolacs have previously been shown to become insolubilized by heating them in the presence of onium salt photoproducts.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael J. O'Brien, Michael J. O'Brien, James V. Crivello, James V. Crivello, } "Mid-UV Photoresists Combining Chemical Amplification And Dissolution Inhibition", Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 10.1117/12.968300; https://doi.org/10.1117/12.968300
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