1 January 1988 New 2-Diazocyclohexane-1,3-Dione Photoactive Compounds For Deep U.V. Lithography
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Abstract
The title compounds have been examined as photoactive components of two-part deep UV photoresists. All of the materials synthesized were soluble in typical photoresist solvents. Some were completely retained in photoresist layers baked at 95°C. The dependence of diazo compound retention on structure is discussed. Typical UV spectra of these photoresists are shown as well as the changes that occur on deep UV irradiation. Examples of typical development curves and PROSIM resist profiles are shown.
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George Schwartzkopf, George Schwartzkopf, "New 2-Diazocyclohexane-1,3-Dione Photoactive Compounds For Deep U.V. Lithography", Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 10.1117/12.968301; https://doi.org/10.1117/12.968301
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