1 January 1988 Photospeed Quality Control In Photoresist Manufacturing
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Abstract
Process windows have shrunk dramatically with the advent of micron and submicron processes in semiconductor manufacturing. Because of this trend, photospeed testing has become an especially critical aspect of photoresist quality control. The purpose of this paper is to describe and evaluate and test methods which can be used by a manufacturer to qualify resist lots. In addition, the applications and benefits of Statistical Quality Control and photospeed certification programs are discussed.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jeffrey K. Hecht, Jeffrey K. Hecht, Barbara J. Brown, Barbara J. Brown, Edward J. Reardon, Edward J. Reardon, } "Photospeed Quality Control In Photoresist Manufacturing", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); doi: 10.1117/12.968393; https://doi.org/10.1117/12.968393
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