1 January 1988 Stepper Lens Characterization Using A Field Emission SEM
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Abstract
A method of stepper lens evaluation has been developed which utilizes a simple resolution test pattern of the type usually supplied with the stepper. Measurements are made using an automated field emission SEM equipped to perform whole wafer non-destructive critical dimension analysis. Measurement data on focus and sizing is then analyzed by a computer program easily run on a small personal computer. Information on reticle sizing errors and wafer flatness may also be included in the analysis to minimize errors.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mike Tipton, Mike Tipton, Marylyn Hoy Bennett, Marylyn Hoy Bennett, Jim Pollard, Jim Pollard, Jack Smith, Jack Smith, Ricky Jackson, Ricky Jackson, } "Stepper Lens Characterization Using A Field Emission SEM", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); doi: 10.1117/12.968352; https://doi.org/10.1117/12.968352
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