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1 January 1988 Technologies For Automated In-Process E-Beam Metrology
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Abstract
A new wafer metrology system, featuring high throughput, automation, and E-beam accuracy has been developed. Novel technologies were integrated into the system in order to meet the stringent requirements of in-process VLSI critical dimension control.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Israel Nadler-Niv and Uriel Halavee "Technologies For Automated In-Process E-Beam Metrology", Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); https://doi.org/10.1117/12.968346
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