1 January 1988 A Compact Optical Imaging System For Resist Process And Lithography Research
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Abstract
A compact small field 20:1 reduction optical imaging system has been developed to provide a stable platform for printing submicron lithographic images at 248nm in resist without the cost and complexity of production equipment. The target applications are those in the areas of process development for resists in UV and deep UV and R&D laboratories and universities doing image science. In all of these applications, the normal issues of production lithography such as throughput, field size, automated substrate handling, etc. are unimportant. A simple bench top lithography system without these production oriented constraints is described.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John H. Bruning, William Oldham, "A Compact Optical Imaging System For Resist Process And Lithography Research", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968448; https://doi.org/10.1117/12.968448
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