1 January 1988 Excimer Projection Lithography At 193-nm Wavelength
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Proceedings Volume 0922, Optical/Laser Microlithography; (1988); doi: 10.1117/12.968447
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States
Abstract
Excimer laser projection lithography is expected to become a widely used technique, capable of high throughputs at resolution well below 0.5 μm. In this paper we demonstrate excimer projection patterning with 0.13-μm resolution, and we address issues related to laser engineering and optical materials, which are encountered in the design of practical excimer projection systems.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Rothschild, D. J. Ehrlich, "Excimer Projection Lithography At 193-nm Wavelength", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968447; https://doi.org/10.1117/12.968447
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KEYWORDS
Excimer lasers

Modulation transfer functions

Excimers

Optical lithography

Projection systems

Projection lithography

Tolerancing

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