Excimer laser projection lithography is expected to become a widely used technique, capable of high throughputs at resolution well below 0.5 μm. In this paper we demonstrate excimer projection patterning with 0.13-μm resolution, and we address issues related to laser engineering and optical materials, which are encountered in the design of practical excimer projection systems.
D. J. Ehrlich,
"Excimer Projection Lithography At 193-nm Wavelength", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968447; https://doi.org/10.1117/12.968447