1 January 1988 Exposure Dose Control Techniques For Excimer Laser Lithography
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Abstract
Measurements of pulse-to-pulse energy fluctuation statistics were made at several wave-lengths for a commercial discharge pumped excimer laser, under a variety of operating conditions. Various approaches to achieving accurate exposure dose control in microlithographic exposure tools using noisy pulsed sources are discussed. A pulse-by-pulse active control technique for static field lithography is described in detail, together with measured performance data. Alternative techniques suitable for one dimensional scanning slit field exposure tools are presented.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David H. Tracy, David H. Tracy, Fred Y. Wu, Fred Y. Wu, } "Exposure Dose Control Techniques For Excimer Laser Lithography", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968442; https://doi.org/10.1117/12.968442
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