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1 January 1988 Measuring Photoresist Spectral Response With A Spectrosensitometer
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As optical lithography moves into the area of submicron geometries, an increased understanding of lithographic process parameters is required. One area which requires careful examination is the interaction of the photoresist with specific spectral components of the actinic light. This will allow the photoresist performance to be separated from the performance of the imaging optics. An accurate indication of photoresist performance requires the measurement of photoresist response to a specific wavelength and energy dose. The spectrosensitometer reported on here was developed to address this need.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert M Cogley, Steven E Knight, and Thomas J Toomey "Measuring Photoresist Spectral Response With A Spectrosensitometer", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988);

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