New 5X i-Line Projection Aligner For VLSI Fabrication

Shuji Sugiyama; Tsutomu Tawa; Yoshitada Oshida; Toshiei Kurosaki; Fumio Mizuno

doi:10.1117/12.968429

1 January 1988 New 5X i-Line Projection Aligner For VLSI Fabrication

Shuji Sugiyama, Tsutomu Tawa, Yoshitada Oshida, Toshiei Kurosaki, Fumio Mizuno

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968429
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

A new i-line projection aligner, the LD-5010i, has been developed and has two primary features : good patterning ability and good overlay accuracy. In this paper, performance of the i-line projection system and the characteristic alignment method, called the two-wavelength detection, are described.

Citation Download Citation

Shuji Sugiyama, Tsutomu Tawa, Yoshitada Oshida, Toshiei Kurosaki, and Fumio Mizuno "New 5X i-Line Projection Aligner For VLSI Fabrication", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968429

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