1 January 1988 New 5X i-Line Projection Aligner For VLSI Fabrication
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Abstract
A new i-line projection aligner, the LD-5010i, has been developed and has two primary features : good patterning ability and good overlay accuracy. In this paper, performance of the i-line projection system and the characteristic alignment method, called the two-wavelength detection, are described.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shuji Sugiyama, Tsutomu Tawa, Yoshitada Oshida, Toshiei Kurosaki, Fumio Mizuno, "New 5X i-Line Projection Aligner For VLSI Fabrication", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968429; https://doi.org/10.1117/12.968429
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