Routes To Half-Micron Lithography

Setha G. Olson; John H. Bruning; Michael C. King

doi:10.1117/12.968427

1 January 1988 Routes To Half-Micron Lithography

Setha G. Olson, John H. Bruning, Michael C. King

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968427
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Alternative routes to 0.5μm lithography made possible by new developments in lenses, excimer lasers and resists are discussed. Steppers using excimer laser illumination with wavelength of 248nm provide 0.5μm lithography. Advanced processing techniques such as image reversal and contrast enhancement materials, make possible dramatic increases in resolution. New higher numerical aperture i-line lenses coupled with these processes also provide 0.5μm lithography. Experimental results illustrate the possibilities and trade-offs of alternate technologies.

Citation Download Citation

Setha G. Olson, John H. Bruning, and Michael C. King "Routes To Half-Micron Lithography", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968427

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