1 January 1988 The Design Of Excimer Lasers For Use In Microlithography
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Abstract
This paper discusses the different factors which need to be addressed in the development of excimer lasers for use in microlithography. Included is a brief description of the basics of excimer laser technology and a short history of the use of excimer lasers in microlithography. Emphasis is placed on the differences between excimer lasers designed for use in microlithography and conventional excimer lasers. The paper concludes with a discussion of maintenance issues and operating costs.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
T. A. Znotins, T. A. Znotins, T. J. McKee, T. J. McKee, S. J. Gutz, S. J. Gutz, K. O. Tan, K. O. Tan, W. B. Norris, W. B. Norris, } "The Design Of Excimer Lasers For Use In Microlithography", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968445; https://doi.org/10.1117/12.968445
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