1 January 1988 The Future Of Projection Lenses And The New G-Line Lens For 0.7 µm Lithography
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This paper describes the development of g-line projection lenses as shown by an investigation of the decreasing value of focus depth due to lens production errors. It presents a study of the decreasing value and forecasts what the depth of focus will be for each linewidth in optical lithography in the next several years. Next we report the image performance of a new lens with a high numerical aperture that has been developed recently. This is the 5x reduction lens with a field size of 15 mm square (21.2 mm diameter) and a numerical aperture that is switchable between 0.48 and 0.43. The practical resolution is 0.7 μm and distortion is less than 0.1 μm over the image field. The depth of focus is in the range of 1.5 μm. In addition, we report the potential of this lens for achieving a resolution of less than 0.6 μm.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masakatsu Ohta, Toshiyuki Kojima, Chiaki Sato, Tohru Ogawa, Miyoko Noguchi, "The Future Of Projection Lenses And The New G-Line Lens For 0.7 µm Lithography", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968426; https://doi.org/10.1117/12.968426


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