The Optical Stepper With A High Numerical Aperture I-Line Lens And A Field-By-Field Leveling System

Kyoichi Suwa; Kazuo Ushida

doi:10.1117/12.968424

1 January 1988 The Optical Stepper With A High Numerical Aperture I-Line Lens And A Field-By-Field Leveling System

Kyoichi Suwa, Kazuo Ushida

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968424
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

A high N.A. i-line lens and a field-by-field leveling system have been developed. Resolution of the lens is better than 0.65 μm. The leveling system has achieved ±0.3 uμ/field on an experimental basis.

Citation Download Citation

Kyoichi Suwa and Kazuo Ushida "The Optical Stepper With A High Numerical Aperture I-Line Lens And A Field-By-Field Leveling System", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968424

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