1 January 1988 Use Of Carbonized Photoresist For Optical Mask Repair
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Abstract
Carbonized novolac photoresist has been demonstrated as a patching material for clear defects in optical masks. The processing is simple and uses commonly available equipment. The patches, though not as tough as chrome, adhere well and survive mask cleaning. Mask materials appear to survive heating up to 1000°C, but distortion testing has only been done up to 500°C. Adhesion of the carbonized resist begins to degrade above 700°C processing temperature.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael S. Hibbs, Michael S. Hibbs, Burn J. Lin, Burn J. Lin, Yuli Vladimirsky, Yuli Vladimirsky, } "Use Of Carbonized Photoresist For Optical Mask Repair", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968399; https://doi.org/10.1117/12.968399
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