A Focusing Column For A Low Energy Focused Ion Beam Instrument

Haruo Kasahara; Hiroshi Sawaragi; Ryuso Aihara; M.Hassel Shearer

doi:10.1117/12.945637

14 June 1988 A Focusing Column For A Low Energy Focused Ion Beam Instrument

Haruo Kasahara, Hiroshi Sawaragi, Ryuso Aihara, M.Hassel Shearer

Proceedings Volume 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII; (1988) https://doi.org/10.1117/12.945637
Event: Medical Imaging II, 1988, Newport Beach, CA, United States

Abstract

Low energy FIB less than 1 keV is useful for shallow doping or gas-assisted etching without damage to the substrate. An optical system with a retarding field has the ability to focuse an ion beam of low energy into a spot less than 0.1 μm in diameter. An improved type of the retarding mode optical system with a retarding electrode was designed, and some optical property calculations were achieved for this system. A retarding electrode above the specimen surface enables SE detection, but it worsens the focusing properties. Better focusing conditions are found by introducing a condenser lens to this system.

Citation Download Citation

Haruo Kasahara, Hiroshi Sawaragi, Ryuso Aihara, and M.Hassel Shearer "A Focusing Column For A Low Energy Focused Ion Beam Instrument", Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); https://doi.org/10.1117/12.945637

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