14 June 1988 A Simple Metal Pn Polymer Process Using Pulsed Electron Beams In Soft Vacuum
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Abstract
We describe the proximity patterning using 28 kV, soft vacuum exposing electrons of silver, copper and gold containing metal-polymer composite films. The cross-linking of the metal doped polyamic acid, resulting in reduced solubility of exposed regions, leads to successful patterning following conventional wet development. The patterned films were found to contain the metal content redistributed, preferentially enriching the surface during the imidization cure, as supported by a variety of surface analysis methods.
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J Krishnaswamy, J Krishnaswamy, Mark Eyolfson, Mark Eyolfson, L Li, L Li, G J Collins, G J Collins, H Hiraoka, H Hiraoka, Mary Ann Caolo, Mary Ann Caolo, "A Simple Metal Pn Polymer Process Using Pulsed Electron Beams In Soft Vacuum", Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945659; https://doi.org/10.1117/12.945659
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