14 June 1988 Microcircuit Modification Using Focused Ion Beams
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Abstract
Focused-ion-beam (FIB) microcircuit modification is a maturing technology which provides an accurate method of modifying the metal levels of an in-process or completed integrated circuit. New FIB processes are being developed which facilitate submicrometer conductor disconnects and conductor creation. We present a description of the key elements of an FIB system designed for this application and provide results of the machine's operation.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B W Ward, B W Ward, N. P Economou, N. P Economou, D. C Shaver, D. C Shaver, J E. Ivory, J E. Ivory, M. L Ward, M. L Ward, L. A, Stern, L. A, Stern, } "Microcircuit Modification Using Focused Ion Beams", Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); doi: 10.1117/12.945636; https://doi.org/10.1117/12.945636
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