16 August 1988 UV/Ozone Removal Of Contaminants In Spacecraft Environments
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Abstract
The UV/Ozone cleaning process has been studied as both a method for preventing contamin-ant films from forming on optical surfaces of a space sensor during storage, and for removing them from these surfaces after formation. Using mercury resonance lines at 253.7 and 184.9 nm and 02 pressures in the range of 8 x 10-5 to 4 x 10-4 torr, removal efficiencies from 1.8 x 10-26 to 4.4 x 10-26 cm3/photon were measured. The UV/Ozone process has been shown to be an effective method for preventing contaminant buildup during the storage of a sensor. If the removal efficiencies can be improved, as expected, by using higher energy photons, the UV/Ozone process should also prove to be a viable method for cleaning contaminant films from optical surfaces in space.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. B. Kalem, C. B. Kalem, J. R. Blanco, J. R. Blanco, R. J. Champetier, R. J. Champetier, } "UV/Ozone Removal Of Contaminants In Spacecraft Environments", Proc. SPIE 0932, Ultraviolet Technology II, (16 August 1988); doi: 10.1117/12.946899; https://doi.org/10.1117/12.946899
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