23 August 1988 Magnetron Sputtering High Tc Films From Metal Alloy Targets
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Proceedings Volume 0948, High-Tc Superconductivity: Thin Films and Devices; (1988) https://doi.org/10.1117/12.947475
Event: Advances in Semiconductors and Superconductors: Physics and Device Applications, 1988, Newport Beach, CA, United States
Abstract
High Tc YBaCuO thin films have been deposited by dc magnetron sputtering from two metal alloy targets. Oxygen was sprayed directly onto the film to be chemically incorporated into the film. Since most of the oxygen was absorbed by the film directly, low oxygen partial pressure was achieved to avoid target oxidation. Epitaxial and polycrystalline films with onsets at 92 K having 1 K transition widths have been produced. Films have been deposited on a variety of substrates including LiNbO3 and LiTa03. For potential application in electronic devices and for many electrical measurements, it is important to pattern the films. Laser patterning has been demonstrated successfully with no degradation of the film properties. The advantages of laser processing are short turn around time and no wet processing associated with conventional lithography. Using this technique, lines as narrow as 1 micron have been fabricated.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael Scheuermann, Cheng-Chung Chi, Chang C. Tsuei, Jochen D. Mannhart, "Magnetron Sputtering High Tc Films From Metal Alloy Targets", Proc. SPIE 0948, High-Tc Superconductivity: Thin Films and Devices, (23 August 1988); doi: 10.1117/12.947475; https://doi.org/10.1117/12.947475
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