Laser Chemical Vapor Deposited (LCVD) Tio2 And Al203 Films On Silica And D-Shaped Si02-Ge02 Fibers: An Improved Surface To Grow Photonic Devices

G. Kordas; X D Lin; Z J. Chen; S. DiVita

doi:10.1117/12.948182

16 January 1989 Laser Chemical Vapor Deposited (LCVD) Tio2 And Al203 Films On Silica And D-Shaped Si02-Ge02 Fibers: An Improved Surface To Grow Photonic Devices

G. Kordas, X D Lin, Z J. Chen, S. DiVita

Author Affiliations +

Proceedings Volume 0970, Properties and Characteristics of Optical Glass; (1989) https://doi.org/10.1117/12.948182
Event: 32nd Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1988, San Diego, CA, United States

Abstract

TiO2 and Al203 films were developed by laser chemical vapor deposition (LCVD) technique on silica and D-shaped Si02-Ge02 fiber surfaces. The films were produced by CO2 laser assisted dissociation of TiCI4, AlC13, and trimethyl aluminum and diffusion of ions in the glass. The laser power chosen was to be between 100 and 550 W and the exposure time ranged from 20 to 120 sec. The films were analyzed by SIMS, XPS, ellipsometry, and XRD. The T102 film thickness was varied between 1.5 and 3.5 pm thru the exposure time and laser power variation. XPS demonstrated the formation of TiO2 and A103 on glass surfaces while XRD indicated the growth of rutile on glasses with the 110-axis perpendicular to their surface. The refractive index of the glasses increased from 1.4588 up to 2.505 after TiO2 deposition.

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G. Kordas, X D Lin, Z J. Chen, and S. DiVita "Laser Chemical Vapor Deposited (LCVD) Tio2 And Al203 Films On Silica And D-Shaped Si02-Ge02 Fibers: An Improved Surface To Grow Photonic Devices", Proc. SPIE 0970, Properties and Characteristics of Optical Glass, (16 January 1989); https://doi.org/10.1117/12.948182

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