Characterization Of Imperfections In Thin-Film Multilayer Devices

A. M. Saxena

doi:10.1117/12.948744

18 January 1989 Characterization Of Imperfections In Thin-Film Multilayer Devices

A. M. Saxena

Proceedings Volume 0983, Thin Film Neutron Optical Devices: Mirrors, Supermirrors, Multilayer Monochromators, Polarizers, and Beam Guides; (1989) https://doi.org/10.1117/12.948744
Event: 32nd Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1988, San Diego, CA, United States

Abstract

The fabrication of high reflectivity multilayer minochromators usually involves depositing a greater number of bilayers than the calculated number for perfect multilayers. This deviation from ideal behavior occurs due to the presence of imperfections in layers. These imperfections are strongly dependent on the deposition process employed and the parameters during deposition. An understanding of the types of imperfections present may lead to attempts to minimize them. The imperfections should be taken into consideration for determining the sequence of d-spacing for making a supermirror.

Citation Download Citation

A. M. Saxena "Characterization Of Imperfections In Thin-Film Multilayer Devices", Proc. SPIE 0983, Thin Film Neutron Optical Devices: Mirrors, Supermirrors, Multilayer Monochromators, Polarizers, and Beam Guides, (18 January 1989); https://doi.org/10.1117/12.948744

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