Application Of W/Si Multilayers For Monochromatization Of Soft X-Ray Synchrotron Radiation

F. Schaefers; M. Grioni; J. Wood; H van Brug; E. J. Puik.; M. Dapor; F. Marchetti

doi:10.1117/12.948766

16 December 1988 Application Of W/Si Multilayers For Monochromatization Of Soft X-Ray Synchrotron Radiation

F. Schaefers, M. Grioni, J. Wood, H van Brug, E. J. Puik., M. Dapor, F. Marchetti

Proceedings Volume 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers; (1988) https://doi.org/10.1117/12.948766
Event: 32nd Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1988, San Diego, CA, United States

Abstract

We have used W/Si multilayers and multilayer/KAP crystal combinations in a double crystal monochromator beamline at BESSY. The throughput in the energy region from 200 to 1600 eV was drastically increased as compared with previous experiments and thus the performance compares favourably with other monochromators using conventional optics in this energy region. XAS spectra of the 2p edges of 3d transition metals are shown. No x-ray induced damage of the multilayers could be detected using Auger depth profile analysis after one week of exposure to the synchrotron beam. AES profiles distinguished up to the first 30 layers. Our XAS results open up the possibility of constructing multielement high resolution soft x-ray monochromators as well as high intensity broadband monochromators.

Citation Download Citation

F. Schaefers, M. Grioni, J. Wood, H van Brug, E. J. Puik., M. Dapor, and F. Marchetti "Application Of W/Si Multilayers For Monochromatization Of Soft X-Ray Synchrotron Radiation", Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); https://doi.org/10.1117/12.948766

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