16 December 1988 Assessment Of Multilayer Mirror For XUV Laser Use
Author Affiliations +
We here present a new, simple and experimentally unambiguous method of assessing the reflectivity of concave X-ray multilayer mirrors. Preliminary results indicating reflectivities ≈80% of the calculated value are shown for mirrors of 100mm radius of curvature fabricated for use in a 236Å XUV laser scheme.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M Grande, B L Evans, A M. H. Al Arab, N H Rizvi, Shi Xu, "Assessment Of Multilayer Mirror For XUV Laser Use", Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); doi: 10.1117/12.948794; https://doi.org/10.1117/12.948794


A Monochromator Based On WIC Multilayers Of 40A Layer Spacing
Proceedings of SPIE (December 16 1988)
XUV optics for attosecond applications
Proceedings of SPIE (September 20 2007)
EUV and soft x-ray multilayer optics
Proceedings of SPIE (February 25 2004)

Back to Top