16 December 1988 Comparison Among Multilayer Soft X-Ray Mirrors Fabricated By Electron Beam, Dc-, Rf-Magnetron Sputtering And Ion Beam Sputtering Deposition
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Abstract
Multilayer Mo/Si mirrors have been fabricated by various physical vapor deposition methods. The best mirror fabricated by RF-magnetron sputtering showed a reflectivity of 57.8% at an incident angle of 25° and at a wavelength of 12.66 nm with synchrotron radiation reflectometer. The characteristics of fabricated multilayer mirrors have been measured using transmission electron microscope for surface and cross-sectional micrographs, electron diffraction for crystalline nature, small-angle x-ray diffractometer and synchrotron radiation reflectometer for reflectivity. Particularly, the dependencies of deposition parameters of Ar pressure and input power in RF-magnetron sputtering and substrate temperature in electron beam deposition in ultra high vacuum, have been investigated. The crystalization of Mo layers is clearly admitted for the mirrors by DC-and RF-magnetron sputtering. Surface roughness is minimum for the mirrors by RF-magnetron sputtering and ion beam sputtering. A possible reason of low reflectivity for the mirrors by ion beam sputtering is discussed from the resluts of additional analysis.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shigetaro Ogura, Shigetaro Ogura, Masahito Niibe, Masahito Niibe, Yutaka Watanabe, Yutaka Watanabe, Masami Hayashida, Masami Hayashida, Takashi Iizuka, Takashi Iizuka, } "Comparison Among Multilayer Soft X-Ray Mirrors Fabricated By Electron Beam, Dc-, Rf-Magnetron Sputtering And Ion Beam Sputtering Deposition", Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); doi: 10.1117/12.948781; https://doi.org/10.1117/12.948781
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