Matricial Formalism For Interfacial Roughness Analysis Of LSMs

B. Pardo; L. Nevot; J-M Andre

doi:10.1117/12.948784

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16 December 1988 Matricial Formalism For Interfacial Roughness Analysis Of LSMs

B. Pardo, L. Nevot, J-M Andre

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Proceedings Volume 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers; (1988) https://doi.org/10.1117/12.948784
Event: 32nd Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1988, San Diego, CA, United States

Abstract

The matricial formalism is adopted to treat the influence of the interfacial roughness. It is shown that the matrix characterizing the interface is modified in such a way that the Fresnel reflection coefficient is decreased and the Fresnel transmission coefficient is en-hanced by appropriate factors. These coefficients are formally similar to the so-called Debye-Waller factor, but they take account of the effective wavenumber of each medium. It results that a rough interface is in a way, equivalent to a homogeneous transition layer. Examples of characterization using measurements performed at 0.154 nm are given.

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B. Pardo, L. Nevot, and J-M Andre "Matricial Formalism For Interfacial Roughness Analysis Of LSMs", Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); https://doi.org/10.1117/12.948784

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