16 December 1988 Multilayer Reflection Filters For Soft X-Rays
Author Affiliations +
Abstract
Multilayer reflection filters were designed for use in photo-CVD experiments with soft X-rays of ≈100 eV. Mo/Si (27 layers) and Rh/Si (21 layers) filters were fabricated on superpolished CVD-SiC substrates by means of ion-beam sputtering. Their spectral reflectances were measured at 10°-55° angles of incidence over a photon energy range of 65-115 eV. A peak reflectance of 43% and a FWIIM of ≈8 eV were found at ≈49° angle of incidence for soft X-rays of ≈100 eV. The filters were then used as a dispersive element in photo-CVD experiments at the Photon Factory. It was found that the filters could withstand strong undispersed synchrotron radiation for many hours, retaining a reflectance of ≈28%, and that they were able to deliver a narrow-band photon flux of ≈1015 photons/s at ≈100 eV into the photo-reaction chamber.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mihiro Yanagihara, Masaki Yamamoto, Akira Arai, Jianlin Cao, Takeshi Namioka, "Multilayer Reflection Filters For Soft X-Rays", Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); doi: 10.1117/12.948791; https://doi.org/10.1117/12.948791
PROCEEDINGS
6 PAGES


SHARE
RELATED CONTENT

Laterally graded multilayer optics for x-ray analysis
Proceedings of SPIE (November 23 1999)
EUV multilayer optics for space science and ultrafast science
Proceedings of SPIE (February 18 2011)
Multilayer growth in the APS rotary deposition system
Proceedings of SPIE (September 20 2007)
Multilayer coatings on figured optics
Proceedings of SPIE (January 01 1992)
Si-based multilayers with high thermal stability
Proceedings of SPIE (November 08 2000)

Back to Top