16 December 1988 Multilayer Reflection Filters For Soft X-Rays
Author Affiliations +
Abstract
Multilayer reflection filters were designed for use in photo-CVD experiments with soft X-rays of ≈100 eV. Mo/Si (27 layers) and Rh/Si (21 layers) filters were fabricated on superpolished CVD-SiC substrates by means of ion-beam sputtering. Their spectral reflectances were measured at 10°-55° angles of incidence over a photon energy range of 65-115 eV. A peak reflectance of 43% and a FWIIM of ≈8 eV were found at ≈49° angle of incidence for soft X-rays of ≈100 eV. The filters were then used as a dispersive element in photo-CVD experiments at the Photon Factory. It was found that the filters could withstand strong undispersed synchrotron radiation for many hours, retaining a reflectance of ≈28%, and that they were able to deliver a narrow-band photon flux of ≈1015 photons/s at ≈100 eV into the photo-reaction chamber.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mihiro Yanagihara, Masaki Yamamoto, Akira Arai, Jianlin Cao, Takeshi Namioka, "Multilayer Reflection Filters For Soft X-Rays", Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); doi: 10.1117/12.948791; https://doi.org/10.1117/12.948791
PROCEEDINGS
6 PAGES


SHARE
KEYWORDS
Optical filters

Silicon

Chemical vapor deposition

Molybdenum

Rhodium

Reflectivity

Multilayers

RELATED CONTENT


Back to Top