Automatic Inspection Of Mask Defects

Paul Sandland

doi:10.1117/12.955350

8 August 1977 Automatic Inspection Of Mask Defects

Paul Sandland

Proceedings Volume 0100, Developments in Semiconductor Microlithography II; (1977) https://doi.org/10.1117/12.955350
Event: Developments in Semiconductor Microlithography II, 1977, San Jose, United States

Abstract

Semiconductor yield can be greatly affected by defective photomasks. Various methods of detection of photomask defects have been investigated in the past. This paper discusses some methods available for the detection of random defects and describes a newly developed automatic mask inspection system.

Citation Download Citation

Paul Sandland "Automatic Inspection Of Mask Defects", Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); https://doi.org/10.1117/12.955350

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