14 December 2016 Features of the formation of structure and properties of transition metals boridonitrides composite films
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Proceedings Volume 10010, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VIII; 100100D (2016) https://doi.org/10.1117/12.2243275
Event: Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies 2016, 2016, Constanta, Romania
Abstract
Researches of formation features of nanostructured film condensates deposited by reactive magnetron (HF and DC) sputtering of transition metals diborides targets was analyzed. Amorphous-crystalline composite film (MeB2 + BN), consisting of grains of nanocrystalline phase MeB2 and amorphous graphite-like phase BN filling intergranular space, is formed at reactive sputtering in (Ar + N2) mixture. Investigations of composition and physico-mechanical properties of transition metals boridenitrides composite films were carried out. The amount of phase МеВ2 decreases, and phase BN enlarges with an increase in percentage content of nitrogen in a mixture, that leads to hardness and elastic modulus reduction respectively and to elasticity increase of boridonitrides thin films compared with diborides films. It is shown that viscoelasticity of Me–B–N thin films is caused by the presence of amorphous boron nitride phase.
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Alexander A. Goncharov, Andrey N. Yunda, Tomasz N. Kołtunowicz, "Features of the formation of structure and properties of transition metals boridonitrides composite films", Proc. SPIE 10010, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VIII, 100100D (14 December 2016); doi: 10.1117/12.2243275; https://doi.org/10.1117/12.2243275
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