14 December 2016 Technological studies for plasmonic metasurfaces
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Proceedings Volume 10010, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VIII; 100101U (2016) https://doi.org/10.1117/12.2243293
Event: Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies 2016, 2016, Constanta, Romania
Abstract
This work will present the technological processes necessary to experimentally obtain plasmonic metasurfaces for developing flat optical components or diffractive optical elements (DOE) which have reflexion functionalities. This class of metasurfaces offers the possibility to manipulate the beam shape using an array of metallic nanoscale elements patterned on a substrate.

The main feature of these structures is that one can manipulate the phase behavior by modifying some of the geometrical parameters of the nano-antennas in order to achieve the required phase shift values for the desired applications. The first important step in experimentally obtaining a plasmonic metasurface structures is the electron beam lithography (EBL) followed by the lift-off method. Due to the small sizes of the gold nano-antennas and tight periodicity of the array a number of impediments can emerge in experimentally obtaining such geometries which can be overcome by the parameter optimization of the employed technologies.
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Roxana Tomescu, Roxana Tomescu, Cristian Kusko, Cristian Kusko, Adrian Dinescu, Adrian Dinescu, Bogdan Bita, Bogdan Bita, Marian Popescu, Marian Popescu, } "Technological studies for plasmonic metasurfaces ", Proc. SPIE 10010, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VIII, 100101U (14 December 2016); doi: 10.1117/12.2243293; https://doi.org/10.1117/12.2243293
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