6 December 2016 Characterization of the polishing induced contamination of fused silica optics
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Abstract
Secondary Ion Mass Spectroscopy (SIMS), Electron Probe Micro Analysis (EPMA) and X-Ray Photoelectron Spectroscopy (XPS) were used to analyze the polishing induced contamination layer at the fused silica optics surface. Samples were prepared using an MRF polishing machine and cerium-based slurry. The cerium and iron penetration and concentration were measured in the surface out of defects. Cerium is embedded at the surface in a 60 nm layer and concentrated at 1200 ppmw in this layer while iron concentration falls down at 30 nm. Spatial distribution and homogeneity of the pollution were also studied in scratches and bevel using SIMS and EPMA techniques. An overconcentration was observed in the chamfer and we saw evidence that surface defects such as scratches are specific places that hold the pollutants. A wet etching was able to completely remove the contamination in the scratch.
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Mathilde Pfiffer, Mathilde Pfiffer, Jean-Louis Longuet, Jean-Louis Longuet, Christine Labrugère, Christine Labrugère, Evelyne Fargin, Evelyne Fargin, Bruno Bousquet, Bruno Bousquet, Marc Dussauze, Marc Dussauze, Sébastien Lambert, Sébastien Lambert, Philippe Cormont, Philippe Cormont, Jérôme Néauport, Jérôme Néauport, } "Characterization of the polishing induced contamination of fused silica optics", Proc. SPIE 10014, Laser-Induced Damage in Optical Materials 2016, 100141F (6 December 2016); doi: 10.1117/12.2244980; https://doi.org/10.1117/12.2244980
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